The Only Maker of EUVWide moat
ASML (ASML) — moat facet
Every advanced chip on earth passes under an ASML light source — the whole market, one vendor.
The single most important fact about ASML is the bluntest: it holds one hundred percent of the EUV lithography market1, because it is the only company that makes an EUV machine. Nikon and Canon, ASML's historic rivals in older lithography, never cracked EUV and effectively conceded the leading edge2; ASML stands entirely alone. This is monopoly in its textbook form — not a dominant share to be defended against challengers, but the absence of any challenger at all in the one technology that makes advanced chips possible.
A hundred-percent share of an essential, irreplaceable product is the strongest competitive position a company can occupy, and it confers everything that flows downstream: pricing power (the customer has no alternative), priority in a shortage (ASML decides who gets machines and when), and a seat at the center of the entire semiconductor industry's planning. When your product is the sole gateway to the future of computing, you do not compete for the business — the business comes to you, hat in hand, and waits its turn. That is ASML's position, and it has held it since EUV became viable.
Stable at the ceiling. You can't widen a 100% share — this is a maxed-out monopoly holding firm, with no rival in sight. What grows is how much the world depends on it, not the share itself.
The price a sole supplier can charge rises each generation. A fall with volumes steady would mean customers had found leverage.
- Reported100% of the EUV lithography market.ASML — sole maker of EUV lithography (13.5nm light; ~two decades and tens of billions to develop; Nikon and Canon never fielded EUV; required below the 7nm node) — EUV in volume production since ~2018 · publ. 2018-2026 · source ↗
- ReportedNikon and Canon never cracked EUV and conceded the leading edge.ASML — sole maker of EUV lithography (13.5nm light; ~two decades and tens of billions to develop; Nikon and Canon never fielded EUV; required below the 7nm node) — EUV in volume production since ~2018 · publ. 2018-2026 · source ↗